Researched
Photolithography for Chips
Light-sensitive resist and a mask let engineers print tiny transistor patterns onto silicon; Bell Labs adapts it in 1955.
Open in the interactive tree →Jules Andrus and Walter Bond at Bell Labs applied Kodak photoresist to semiconductor wafers in 1955, and Lathrop and Nall at the US Army developed it for transistors in the same years. All chip patterns are printed in this way, only with ever shorter light.
Prerequisites
- Photography1839
- Transistor1947
Unlocks
- Integrated Circuit1958-1959Printing circuit patterns with light masks is how ICs are made
- Planar Process1959
Sources
More in Electronics & Computing · Atomic & Space Age
- Microwave Oven1945
- Stored-Program Architecture1945
- Transistor1947
- Hard Disk Drive1956
- Programming Languages1957
- Integrated Circuit1958-1959
- MOSFET and CMOS chips1959
- Planar Process1959