Researched
Tin-Plasma EUV Light Source
A CO2 laser hits falling tin droplets 50,000 times a second; the plasma emits 13.5 nm light. Cymer delivers the first integrated source in 2009.
Open in the interactive tree →Cymer, which ASML bought in 2013, together with the laser maker Trumpf developed the laser-produced-plasma source needed for production EUV. Getting enough stable power from it was the main obstacle before EUV could enter chip production in 2019.
Prerequisites
- CO2 Laser1964
- Multilayer EUV Mirrors1981
- EUV Lithography Proof of Concept1986-1997
Unlocks
- EUV Lithography2019The tin-plasma source gives the 13.5 nm light the machine needs