Researched
Multilayer EUV Mirrors
Underwood and Barbee (1981) stack alternating thin layers so that many weak reflections add up and mirrors work for extreme UV and soft X-rays.
Open in the interactive tree →Molybdenum-silicon stacks reflect about 70 % of 13.5 nm light, but ordinary materials absorb or transmit it. Such mirrors are the only way to focus EUV, since no lens material is transparent.
Prerequisites
Unlocks
- EUV Lithography Proof of Concept1986-1997
- Tin-Plasma EUV Light Source2009
- EUV Lithography2019Multilayer mirrors are the only way to focus 13.5 nm light