Researched
DUV Excimer-Laser Lithography
Kanti Jain at IBM shows in 1982 that an excimer laser can print chips in deep ultraviolet light; 248 nm and 193 nm tools carry chips from the 1990s to today.
Open in the interactive tree →Shorter wavelength means finer detail, and mercury lamps could not give enough deep-UV power. ArF scanners at 193 nm shipped from 2001 and, with later tricks, still make most advanced chips.
Prerequisites
- Anti-Reflection Coatings1935
- Excimer Laser1970
- Wafer Stepper~1978
Unlocks
- EUV Lithography Proof of Concept1986-1997
- Immersion Lithography2003
- EUV Lithography2019EUV scanners succeed the DUV scanner platform and its optics